133
"This atom-to-atom deposition in PVD allows a precise control of density, stoichiometry
and atomic structure of the thin film. By using the appropriate materials and creating
special conditions during the coating process, coatings with desirable chemical properties
such as hardness, lubricity and good adhesion can be created on the handle’s surface."
Groël’s Industrial Chemist
PLASMA
VACUUM CHAMBER
PROCESS GAS
INERT GAS
SUBSTRATE
TARGET
CATHODE
VACUUM PUMP
Open your mind, and project yourself
into a better future.
PHYSICAL VAPOUR DEPOSITION DIAGRAM
